Dual-beam FIB/SEM - FEI Helios Nanolab / FEI Helios 450S
Offered as External Service
Focused Ion Beam (FIB) and Focused electron/ion beam induced deposition (FE(I)BID), system used for surface patterning and complex structures fabrication.
Research group
Technical characteristics
- High tension electron column 50 V - 30 kV
- High tension Ga-column 0.5 kV – 30 kV
- Electron column resolution 0.5 nm at 15 kV and 0.8 nm at 1 kV (STEM)
- FIB milling resolution 10 nm at 30 kV
- GIS percursor for FE(I)BID: platinum, silicon oxide, gold, tungsten, cobalt
- Nanomanipulator with microgripper (Kleindiek)
- LN2 cooling stage (CryoMat )
- EDX silicon drift detectors for elemental analysis (EDAX)
- Detectors: ETD SE, True in-Lens Detector (TLD), STEM II detector, High performance Ion Conversion and Electron (ICE), Concentric Back Scatter (CBS) detector
- iFast software for advanced Dual Beam automation in order to automate the imaging and nanofabrication
- MAPSTM for automatic acquisition of extra large images with high resolution
- AutoSlice&ViewTM software for 3D imaging by sequential sectioning of the sample
Equipment
Areto garbia
300m2-ko areto garbiak ISO 5 (Class 100) eta ISO 7 (Class 1000) klasifikazioa duten guneak ditu, eta nanofabrikazio eta nanokarakterizazio prozesuetarako erabiltzen da.
Tresneria galeria
Adituek kudeatutako abangoardiako tresneria arlo anitzetako ikerlariek erabiltzen dute, mikroskopio elektronikoak, tunel-mikroskopioak, eta nanofabrikazio eta karakterizazio erremintak barne.